Note
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Beliaev¶
Data for Main / Si3n4 / Beliaev
import os
import matplotlib.pyplot as plt
import numpy as np
import refidx as ri
plt.style.use("../../doc/refidx.mplstyle")
db = ri.DataBase()
matid = ['main', 'Si3N4', 'Beliaev']
mat = db.get_item(matid)
wr = mat.wavelength_range
lamb = np.linspace(*wr, 1000)
index = mat.get_index(lamb)
fig, ax = plt.subplots(2, 1, figsize=(3, 3))
ax[0].plot(lamb, index.real, "-", color="#aa0044")
ax[1].plot(lamb, index.imag, "-", color="#6886b3")
ax[0].set_xlabel(r"Wavelength ($\rm μm$)")
ax[1].set_xlabel(r"Wavelength ($\rm μm$)")
ax[0].set_ylabel(r"$n^{\prime}$")
ax[1].set_ylabel(r"$n^{\prime\prime}$")
plt.suptitle(mat)
mat.print_info(
html=True,
tmp_dir=os.path.join("..","..", "doc", "auto_gallery","Si3N4"),
filename="out_main_Si3N4_Beliaev.html",
)
Comments
100 nm thick film deposited by plasma-enchased CVD with certain recipe as an example. Optical properties of SiN films produced by different deposition methods and process parameters can be found in the reference.
References
L. Yu. Beliaev, E. Shkondin, A. V. Lavrinenko, O. Takayama. Optical, structural and composition properties of silicon nitride films deposited by reactive radio-frequency sputtering, low pressure and plasma-enhanced chemical vapor deposition, Thin Solid Films 763, 139568 (2022) (Numerical data kindly provided by Osamu Takayama)
Total running time of the script: (0 minutes 0.391 seconds)
Estimated memory usage: 225 MB